Dry etching methods are all anisotropic processes ... This can become a problem; if the process is not tightly controlled, the etching reactions can extend underneath the resist layer masking ...

A lab mistake led to self-forming spiral patterns on metal surfaces, revealing chemical-mechanical interactions.

The etching and characterization room contains a suite of tools for dry etching and characterization of samples. This includes three dry etchers with a range of capabilities, while characterization ...

Curiosity about a mistake that left tiny dots on a germanium wafer with evaporated metal films led to the discovery of beautiful spiral patterns etched on the surface of the semiconductor by a ...

It's worth noting that wet etching differs from dry etching techniques, such as reactive ion etching (RIE), which use plasma to remove material from a substrate. While both techniques are used in ...