Dry etching methods are all anisotropic processes ... This can become a problem; if the process is not tightly controlled, the etching reactions can extend underneath the resist layer masking ...

It's worth noting that wet etching differs from dry etching techniques, such as reactive ion etching (RIE), which use plasma to remove material from a substrate. While both techniques are used in ...

Further experiments showed that the patterns arise from chemical reactions that are coupled ... Next, the researchers placed a drop of mild etching solution onto the surface and dried it overnight ...